磁(ci)控濺(jian)射鍍膜機詳情

磁控濺(jian)射包括(kuo)很(hen)多種類。各有不同工作原(yuan)理和應用(yong)對象。但有一(yi)共同點：利用(yong)磁場與電(dian)場交互作用(yong)，使電(dian)子在靶(ba)表面附(fu)近成螺旋狀運行，從而增(zeng)大(da)電(dian)子撞(zhuang)擊氬氣產(chan)生(sheng)離子的概(gai)率。所(suo)產(chan)生(sheng)的離子在電(dian)場作用(yong)下(xia)撞(zhuang)向靶(ba)面從而濺(jian)射出靶(ba)材。

靶(ba)(ba)(ba)源分(fen)平衡(heng)式(shi)和(he)非平衡(heng)式(shi)，平衡(heng)式(shi)靶(ba)(ba)(ba)源鍍膜均勻，非平衡(heng)式(shi)靶(ba)(ba)(ba)源鍍膜膜層和(he)基體(ti)(ti)結合力強。平衡(heng)靶(ba)(ba)(ba)源多(duo)用(yong)(yong)(yong)(yong)于(yu)半導(dao)體(ti)(ti)光(guang)學膜，非平衡(heng)多(duo)用(yong)(yong)(yong)(yong)于(yu)磨損裝飾膜。磁(ci)(ci)(ci)(ci)(ci)控(kong)陰極(ji)(ji)(ji)(ji)按(an)照磁(ci)(ci)(ci)(ci)(ci)場位形分(fen)布(bu)不同，大(da)(da)致可(ke)(ke)分(fen)為平衡(heng)態磁(ci)(ci)(ci)(ci)(ci)控(kong)陰極(ji)(ji)(ji)(ji)和(he)非平衡(heng)態磁(ci)(ci)(ci)(ci)(ci)控(kong)陰極(ji)(ji)(ji)(ji)。平衡(heng)態磁(ci)(ci)(ci)(ci)(ci)控(kong)陰極(ji)(ji)(ji)(ji)內外(wai)磁(ci)(ci)(ci)(ci)(ci)鋼的(de)磁(ci)(ci)(ci)(ci)(ci)通量大(da)(da)致相等，兩極(ji)(ji)(ji)(ji)磁(ci)(ci)(ci)(ci)(ci)力線(xian)(xian)閉(bi)合于(yu)靶(ba)(ba)(ba)面，很好地將電(dian)子/等離(li)(li)子體(ti)(ti)約束在(zai)靶(ba)(ba)(ba)面附近，增加(jia)了(le)碰撞幾率(lv)，提高了(le)離(li)(li)化效(xiao)率(lv)，因而在(zai)較(jiao)低的(de)工(gong)作氣(qi)壓和(he)電(dian)壓下就能(neng)起輝并(bing)維持輝光(guang)放電(dian)，靶(ba)(ba)(ba)材(cai)利(li)用(yong)(yong)(yong)(yong)率(lv)相對(dui)較(jiao)高。但由于(yu)電(dian)子沿磁(ci)(ci)(ci)(ci)(ci)力線(xian)(xian)運動(dong)主要(yao)(yao)閉(bi)合于(yu)靶(ba)(ba)(ba)面，基片區(qu)域(yu)所受離(li)(li)子轟擊較(jiao)小。非平衡(heng)磁(ci)(ci)(ci)(ci)(ci)控(kong)濺射(she)(she)技術，即(ji)讓磁(ci)(ci)(ci)(ci)(ci)控(kong)陰極(ji)(ji)(ji)(ji)外(wai)磁(ci)(ci)(ci)(ci)(ci)極(ji)(ji)(ji)(ji)磁(ci)(ci)(ci)(ci)(ci)通大(da)(da)于(yu)內磁(ci)(ci)(ci)(ci)(ci)極(ji)(ji)(ji)(ji)，兩極(ji)(ji)(ji)(ji)磁(ci)(ci)(ci)(ci)(ci)力線(xian)(xian)在(zai)靶(ba)(ba)(ba)面不完全閉(bi)合，部分(fen)磁(ci)(ci)(ci)(ci)(ci)力線(xian)(xian)可(ke)(ke)沿靶(ba)(ba)(ba)的(de)邊(bian)緣延伸到基片區(qu)域(yu)，從(cong)而部分(fen)電(dian)子可(ke)(ke)以沿著(zhu)磁(ci)(ci)(ci)(ci)(ci)力線(xian)(xian)擴展到基片，增加(jia)基片區(qu)域(yu)的(de)等離(li)(li)子體(ti)(ti)密度(du)和(he)氣(qi)體(ti)(ti)電(dian)離(li)(li)率(lv)。不管(guan)平衡(heng)還是(shi)非平衡(heng)，若(ruo)磁(ci)(ci)(ci)(ci)(ci)鐵靜止(zhi)，其磁(ci)(ci)(ci)(ci)(ci)場特性決定了(le)一(yi)般(ban)靶(ba)(ba)(ba)材(cai)利(li)用(yong)(yong)(yong)(yong)率(lv)小于(yu)30%。為增大(da)(da)靶(ba)(ba)(ba)材(cai)利(li)用(yong)(yong)(yong)(yong)率(lv)，可(ke)(ke)采用(yong)(yong)(yong)(yong)旋轉(zhuan)磁(ci)(ci)(ci)(ci)(ci)場。但旋轉(zhuan)磁(ci)(ci)(ci)(ci)(ci)場需要(yao)(yao)旋轉(zhuan)機構(gou)，同時濺射(she)(she)速率(lv)要(yao)(yao)減小。旋轉(zhuan)磁(ci)(ci)(ci)(ci)(ci)場多(duo)用(yong)(yong)(yong)(yong)于(yu)大(da)(da)型(xing)或貴重靶(ba)(ba)(ba)，如半導(dao)體(ti)(ti)膜濺射(she)(she)。對(dui)于(yu)小型(xing)設(she)(she)備和(he)一(yi)般(ban)工(gong)業設(she)(she)備，多(duo)用(yong)(yong)(yong)(yong)磁(ci)(ci)(ci)(ci)(ci)場靜止(zhi)靶(ba)(ba)(ba)源。