磁控靶

磁(ci)控濺(jian)射(she)包括(kuo)很多種類。各有不同工作(zuo)(zuo)原理和應用(yong)對象。但有一共(gong)同點(dian)：利用(yong)磁(ci)場(chang)與電場(chang)交互作(zuo)(zuo)用(yong)，使電子(zi)(zi)在(zai)靶表面(mian)附近成(cheng)螺旋狀運行，從而增大電子(zi)(zi)撞(zhuang)擊氬(ya)氣產生(sheng)(sheng)離子(zi)(zi)的概率。所產生(sheng)(sheng)的離子(zi)(zi)在(zai)電場(chang)作(zuo)(zuo)用(yong)下撞(zhuang)向(xiang)靶面(mian)從而濺(jian)射(she)出(chu)靶材(cai)。

靶(ba)(ba)源(yuan)分(fen)平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)式和(he)非平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)式，平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)式靶(ba)(ba)源(yuan)鍍膜(mo)均勻，非平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)式靶(ba)(ba)源(yuan)鍍膜(mo)膜(mo)層和(he)基(ji)體(ti)結(jie)合力(li)(li)強。平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)靶(ba)(ba)源(yuan)多(duo)用(yong)于(yu)半(ban)導(dao)體(ti)光學膜(mo)，非平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)多(duo)用(yong)于(yu)磨(mo)損裝飾膜(mo)。磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)控陰(yin)極(ji)(ji)(ji)按照磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)場(chang)(chang)位形分(fen)布不同(tong)，大(da)(da)致(zhi)可(ke)分(fen)為平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)態(tai)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)控陰(yin)極(ji)(ji)(ji)和(he)非平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)態(tai)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)控陰(yin)極(ji)(ji)(ji)。平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)態(tai)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)控陰(yin)極(ji)(ji)(ji)內外(wai)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)鋼的磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)通量大(da)(da)致(zhi)相(xiang)等，兩極(ji)(ji)(ji)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)力(li)(li)線(xian)(xian)閉(bi)合于(yu)靶(ba)(ba)面(mian)(mian)，很(hen)好地將電子等離(li)(li)子體(ti)約束在靶(ba)(ba)面(mian)(mian)附近，增(zeng)加了碰(peng)撞幾率，提高(gao)了離(li)(li)化效率，因(yin)而在較低的工(gong)作氣(qi)壓和(he)電壓下(xia)就(jiu)能起輝并維持輝光放電，靶(ba)(ba)材利用(yong)率相(xiang)對(dui)較高(gao)。但由于(yu)電子沿(yan)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)力(li)(li)線(xian)(xian)運動(dong)主要閉(bi)合于(yu)靶(ba)(ba)面(mian)(mian)，基(ji)片(pian)(pian)區(qu)域(yu)所(suo)受(shou)離(li)(li)子轟擊較小。非平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)控濺(jian)射技術，即讓磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)控陰(yin)極(ji)(ji)(ji)外(wai)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)極(ji)(ji)(ji)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)通大(da)(da)于(yu)內磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)極(ji)(ji)(ji)，兩極(ji)(ji)(ji)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)力(li)(li)線(xian)(xian)在靶(ba)(ba)面(mian)(mian)不完(wan)全(quan)閉(bi)合，部(bu)分(fen)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)力(li)(li)線(xian)(xian)可(ke)沿(yan)靶(ba)(ba)的邊(bian)緣延伸到基(ji)片(pian)(pian)區(qu)域(yu)，從而部(bu)分(fen)電子可(ke)以(yi)沿(yan)著磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)力(li)(li)線(xian)(xian)擴展到基(ji)片(pian)(pian)，增(zeng)加基(ji)片(pian)(pian)區(qu)域(yu)的等離(li)(li)子體(ti)密度和(he)氣(qi)體(ti)電離(li)(li)率。不管平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)還是非平(ping)(ping)(ping)(ping)衡(heng)(heng)(heng)(heng)，若磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)鐵(tie)靜止，其磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)場(chang)(chang)特性決(jue)定了一(yi)般靶(ba)(ba)材利用(yong)率小于(yu)30%。為增(zeng)大(da)(da)靶(ba)(ba)材利用(yong)率，可(ke)采用(yong)旋轉(zhuan)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)場(chang)(chang)。但旋轉(zhuan)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)場(chang)(chang)需(xu)要旋轉(zhuan)機構，同(tong)時濺(jian)射速率要減小。旋轉(zhuan)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)場(chang)(chang)多(duo)用(yong)于(yu)大(da)(da)型或貴重靶(ba)(ba)，如半(ban)導(dao)體(ti)膜(mo)濺(jian)射。對(dui)于(yu)小型設備和(he)一(yi)般工(gong)業設備，多(duo)用(yong)磁(ci)(ci)(ci)(ci)(ci)(ci)(ci)(ci)場(chang)(chang)靜止靶(ba)(ba)源(yuan)。