磁控(kong)濺(jian)射(she)的(de)(de)工作(zuo)原理是指電(dian)(dian)(dian)子(zi)(zi)(zi)(zi)(zi)在(zai)(zai)電(dian)(dian)(dian)場(chang)E的(de)(de)作(zuo)用(yong)下，在(zai)(zai)飛(fei)向(xiang)(xiang)基(ji)(ji)片(pian)(pian)(pian)過程中(zhong)與氬原子(zi)(zi)(zi)(zi)(zi)發(fa)生(sheng)碰(peng)撞(zhuang)，使其電(dian)(dian)(dian)離(li)產生(sheng)出Ar正離(li)子(zi)(zi)(zi)(zi)(zi)和(he)新的(de)(de)電(dian)(dian)(dian)子(zi)(zi)(zi)(zi)(zi)；新電(dian)(dian)(dian)子(zi)(zi)(zi)(zi)(zi)飛(fei)向(xiang)(xiang)基(ji)(ji)片(pian)(pian)(pian)，Ar離(li)子(zi)(zi)(zi)(zi)(zi)在(zai)(zai)電(dian)(dian)(dian)場(chang)作(zuo)用(yong)下加(jia)速飛(fei)向(xiang)(xiang)陰極靶(ba)(ba)，并以高能(neng)量(liang)轟擊(ji)靶(ba)(ba)表(biao)面(mian)，使靶(ba)(ba)材發(fa)生(sheng)濺(jian)射(she)。在(zai)(zai)濺(jian)射(she)粒(li)子(zi)(zi)(zi)(zi)(zi)中(zhong)，中(zhong)性的(de)(de)靶(ba)(ba)原子(zi)(zi)(zi)(zi)(zi)或分子(zi)(zi)(zi)(zi)(zi)沉積(ji)在(zai)(zai)基(ji)(ji)片(pian)(pian)(pian)上形成(cheng)薄膜，而產生(sheng)的(de)(de)二次電(dian)(dian)(dian)子(zi)(zi)(zi)(zi)(zi)會受到電(dian)(dian)(dian)場(chang)和(he)磁場(chang)作(zuo)用(yong)，產生(sheng)E（電(dian)(dian)(dian)場(chang)）×B（磁場(chang)）所指的(de)(de)方向(xiang)(xiang)漂移，簡稱E×B漂移，其運動(dong)軌跡近(jin)似(si)(si)于(yu)一條擺線。若為環(huan)形磁場(chang)，則(ze)電(dian)(dian)(dian)子(zi)(zi)(zi)(zi)(zi)就(jiu)以近(jin)似(si)(si)擺線形式在(zai)(zai)靶(ba)(ba)表(biao)面(mian)做圓(yuan)周運動(dong)，它們的(de)(de)運動(dong)路徑(jing)不僅很長，而且被束縛在(zai)(zai)靠近(jin)靶(ba)(ba)表(biao)面(mian)的(de)(de)等離(li)子(zi)(zi)(zi)(zi)(zi)體區(qu)域內(nei)，并且在(zai)(zai)該(gai)區(qu)域中(zhong)電(dian)(dian)(dian)離(li)出大(da)量(liang)的(de)(de)Ar 來轟擊(ji)靶(ba)(ba)材，從而實(shi)現了高的(de)(de)沉積(ji)速率。隨(sui)著碰(peng)撞(zhuang)次數的(de)(de)增加(jia)，二次電(dian)(dian)(dian)子(zi)(zi)(zi)(zi)(zi)的(de)(de)能(neng)量(liang)消耗殆盡，逐漸(jian)遠離(li)靶(ba)(ba)表(biao)面(mian)，并在(zai)(zai)電(dian)(dian)(dian)場(chang)E的(de)(de)作(zuo)用(yong)下沉積(ji)在(zai)(zai)基(ji)(ji)片(pian)(pian)(pian)上。由于(yu)該(gai)電(dian)(dian)(dian)子(zi)(zi)(zi)(zi)(zi)的(de)(de)能(neng)量(liang)很低，傳(chuan)遞給(gei)基(ji)(ji)片(pian)(pian)(pian)的(de)(de)能(neng)量(liang)很小，致(zhi)使基(ji)(ji)片(pian)(pian)(pian)溫升較(jiao)低。

磁控濺(jian)(jian)射(she)是入射(she)粒子(zi)(zi)(zi)(zi)(zi)和(he)靶(ba)(ba)的(de)碰撞(zhuang)(zhuang)過(guo)程(cheng)。入射(she)粒子(zi)(zi)(zi)(zi)(zi)在靶(ba)(ba)中經歷復(fu)雜的(de)散射(she)過(guo)程(cheng)，和(he)靶(ba)(ba)原子(zi)(zi)(zi)(zi)(zi)碰撞(zhuang)(zhuang)，把部分動量傳(chuan)給靶(ba)(ba)原子(zi)(zi)(zi)(zi)(zi)，此靶(ba)(ba)原子(zi)(zi)(zi)(zi)(zi)又和(he)其他(ta)靶(ba)(ba)原子(zi)(zi)(zi)(zi)(zi)碰撞(zhuang)(zhuang)，形成(cheng)級聯(lian)過(guo)程(cheng)。在這種級聯(lian)過(guo)程(cheng)中某些表面附近的(de)靶(ba)(ba)原子(zi)(zi)(zi)(zi)(zi)獲得向外運動的(de)足夠動量，離開靶(ba)(ba)被(bei)濺(jian)(jian)射(she)出(chu)來。